Chris's Recent Papers on Lithography

The papers listed below are available (on-line or in PDF format) by clicking on the titles.

  1. C. A. Mack, "The Future of Semiconductor Lithography: After Optical, What Next?", Future Fab International, Vol. 23 (July 9, 2007).
  2. C. A. Mack, D. Harrison, C. Rivas, and P. Walsh, “Impact of thin film metrology on the lithographic performance of 193nm bottom antireflective coatings”, Optical Microlithography XX, Proc., SPIE Vol. 6518 (2007).
  3. C. A. Mack, “What's So Hard About Lithography?,” presented at the ICMTS (March, 2006).
  4. C. A. Mack, "Accuracy, speed, new physical phenomena: The future of litho simulation," Solid State Technology, February, 2006.
  5. Trey Graves , Mark D. Smith, C. A. Mack, “Methods for Benchmarking Photolithography Simulators: Part IV,” Optical Microlithography XIX, Proc., SPIE Vol. 6154 (2006).
  6. P. Yu, D. Z. Pan, C. A. Mack, “Fast lithography simulation under focus variations for OPC and layout optimizations," Deisgn and Process Integration for Microelectronic Manufacturing IV, Proc., SPIE Vol. 6156, (2006).
  7. C. A. Mack, “From Data to Decisions,” Yield Management Solutions, KLA-Tencor (Spring, 2006) .