Chris's Recent Papers and Talks on Lithography

From the 2015 SPIE Advanced Lithography Symposium, here are both the papers and a recording of the presentations:

"More systematic errors in the measurement of power spectral density":     paper     presentation

"Understanding the efficacy of linewidth roughness post-processing":     paper     presentation

"Analytical Linescan Model for SEM Metrology":     paper     presentation

 

A few recent presentations (click on the titles for a pdf version of the powerpoints):

  1. Chris A. Mack, “The future of lithography and its impact on design, presented at the SPIE Advanced Lithography Conference, February 27, 2013.
  2. Chris A. Mack, "Line-Edge Roughness and the Ultimate Limits of Lithography", presented at the SPIE Advanced Lithography Conference, February, 2012.

 

The papers listed below are available (in PDF format) by clicking on the titles.

  1. Chris A. Mack, “The Multiple Lives of Moore’s Law", IEEE Spectrum, pp. 30-37 (Apr. 2015).
  2. Chris A. Mack and Benjamin D. Bunday, "Analytical Linescan Model for SEM Metrology", Metrology, Inspection, and Process Control for Microlithography XXIX, Proc., SPIE Vol. 9424 (2015) p. 94240F.
  3. Chris A. Mack, "More systematic errors in the measurement of power spectral density", Metrology, Inspection, and Process Control for Microlithography XXIX, Proc., SPIE Vol. 9424 (2015) p. 942403.
  4. Chris A. Mack, "Understanding the efficacy of linewidth roughness post-processing", Advances in Patterning Materials and Processes XXXII, Proc., SPIE Vol. 9425 (2015) p. 94250J.
  5. Chris A. Mack, “Analytical Expression for Impact of Linewidth Roughness on Critical Dimension Uniformity”, Journal of Micro/Nanolithography, MEMS, and MOEMS, Vol. 13, No. 2 (Apr-Jun, 2014) p. 020501.
  6. Benjamin D. Bunday and Chris A. Mack, "Influence of Metrology Error in Measurement of Line Edge Roughness Power Spectral Density", Metrology, Inspection, and Process Control for Microlithography XXVIII, Proc., SPIE Vol. 9050 (2014) p. 90500G.
  7. Siddharth Chauhan, et al., “Mesoscale modeling: a study of particle generation and line-edge roughness”, Journal of Micro/Nanolithography, MEMS, and MOEMS, Vol. 13, No. 1 (Jan–Mar, 2014) p. 013012.
  8. Chris A. Mack, John J. Biafore, and Mark D. Smith, “Stochastic Exposure Kinetics of Extreme Utraviolet Photoresists: Trapping Model ”, Journal of Vacuum Science & Technology B, Vol. 31, No. 6 (Nov/Dec, 2013) p. 06F603-1.
  9. Chris A. Mack, “Defining and measuring development rates for a stochastic resist: a simulation study”, Journal of Micro/Nanolithography, MEMS, and MOEMS, Vol. 12, No. 3 (Jul-Sep, 2013) p. 033006.
  10. Chris A. Mack, "Systematic Errors in the Measurement of Power Spectral Density", Journal of Micro/Nanolithography, MEMS, and MOEMS, Vol. 12, No. 3 (Jul-Sep, 2013) p. 033016.
  11. Chris A. Mack, "Generating random rough edges, surfaces, and volumes", Applied Optics, Vol. 52, No. 7 (1 March 2013) pp. 1472-1480.
  12. Chris A. Mack, “Reaction-diffusion power spectral density Journal of Micro/Nanolithography, MEMS, and MOEMS, Vol. 11, No. 4 (Oct-Dec, 2012) p. 043007.
  13. Prateek Mehrotra, Chris A. Mack, Richard J. Blaikie, “A solid immersion interference lithography system for imaging ultra-high numerical apertures with high-aspect ratios in photoresist using resonant enhancement from effective gain media”, Optical Microlithography XX, Proc., SPIE Vol. 8326 (2012) p. 83260Z.
  14. Chris A. Mack, “Correlated surface roughening during photoresist development”, Advances in Resist Technology and Processing XXIX, Proc., SPIE Vol. 8325 (2012) p. 83250I.
  15. Chris A. Mack, “Defining and measuring development rates for a stochastic resist”, Advances in Resist Technology and Processing XXIX, Proc., SPIE Vol. 8325 (2012) p. 83251K.
  16. Chris. A. Mack, "Analytic form for the power spectral density in one, two, and three dimensions", Journal of Micro/Nanolithography, MEMS, and MOEMS, Vol. 10, No. 4 (Oct-Dec, 2011) p. 040501.
  17. Chris A. Mack, James W. Thackeray, John J. Biafore, and Mark D. Smith, “Stochastic Exposure Kinetics of EUV Photoresists: A Simulation Study”, Journal of Micro/Nanolithography, MEMS, and MOEMS, Vol. 10, No. 3 (Jul-Sep, 2011) p. 033019.
  18. Chris A. Mack, “Fifty Years of Moore’s Law”, IEEE Transactions On Semiconductor Manufacturing, Vol. 24, No. 2 (May, 2011) pp. 202-207.

 

For a complete collection of all of my papers: Technical papers (a complete list)

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