For more information about Chris Mack:
Doctorate in Chemical Engineering, December 1998
Thesis Title: “Modeling Solvent Effects in Optical Lithography”
Master of Science in Electrical Engineering, December 1989
Bachelor of Science degrees in Physics, Electrical Engineering,
Chemistry, and Chemical Engineering, May 1982
● Pursuing intellectual interests, research, writing, and teaching, as reflected on the website www.lithoguru.com.
● Current major research interest: developing an approximate analytical stochastic model of lithography line-edge roughness.
● Consulting in the fields of optics and semiconductor lithography, including lithography technology and model development, legal expert witness services, and business consultation.
● Teaching graduate and undergraduate courses in the Electrical Engineering and Chemical Engineering departments. Graduate courses include Semiconductor Microlithography, Chemical Processes for Microelectronics, and Fourier Optics. Undergraduate courses include Electronic Circuits, Solid State Electronics, and Modern Optics. Served on the committees of numerous PhD dissertations.
● Teaching loads have varied but have averaged 1 – 2 courses per semester.
● Taught undergraduate course in the Electrical Engineering department: Semiconductor Microlithography. Participated in research on evanescent interferometric lithography.
● Taught two graduate courses in the Electrical Engineering department: Semiconductor Microlithography, and Data Analysis and Modeling in the Real World.
● Provided strategic vision in all lithography related products for KLA-Tencor, a $2B Fortune 500 supplier of equipment to the semiconductor industry.
● Directed research efforts for four product divisions across two continents, including lithography simulation, optical and SEM critical dimension metrology, and optical overlay metrology. Obtained funding and managed resource allocation and strategic planning for critical long-term projects.
● Provided and oversaw successful turn-around strategies for two failing product lines.
● Provided internal consulting services in lithography to other KLA-Tencor divisions.
● Oversaw the acquisition of FINLE Technologies by KLA-Tencor and its transition to a successful product division.
● Founded company in 1990, pursuing it full time by the end of 1991.
● Responsible for overall corporate management, vision, strategic planning, technical direction, budgeting, new product development, and lithography research. Grew the company from one person and $60,000 in revenue in 1990 to 25 people and $2.5M in revenue in 2000.
● Developed the industry standard PROLITH Toolkit of lithography simulation software and the ProDATA suite of data analysis software.
● Provided consulting services to the semiconductor industry.
● Taught numerous short courses on optical lithography.
● As an assignee of the department of defense to SEMATECH, provided lithography expertise to SEMATECH on a variety of different projects, including modeling and process development for deep-UV resist systems, processes optimization of the i-line production process, advanced development activities in phase-shifting mask technologies, and lithographic lens design.
● Taught short-term and long-term courses on lithography to SEMATECH staff and assignees.
● As a member of the Microelectronics Research Laboratory (MRL), was tasked with performing research for present and future agency needs in the area of microlithography for semiconductor processing. This work provided a unique blend of theoretical research (e.g., a mechanism for the development reaction, diffraction theory for proximity printing and aerial imaging) and experimental work (measurement of resist properties, model verification). Performed numerous practical and theoretical studies, e.g., resist coating uniformity on wafer tracks, mask bias effects for step-and-repeat printing, exposure optimization, image reversal techniques, and focus effects for submicron lithography. The results of this work have been published in numerous journals and presented at technical conferences, including invited papers at international conferences in Japan and Europe.
EE 411 Circuit Theory (undergraduate)
EE 323 Network Theory II (undergraduate)
EE 325 Electromagnetic Engineering (undergraduate)
EE 338 Electronic Circuits I (undergraduate)
EE 339 Solid State Electronics (undergraduate)
CHE 323 Chemical Engineering for Microelectronics (undergraduate)
PHY 333/EE 347 Modern Optics (undergraduate)
SSC 306 Statistics in Market Analysis (undergraduate)
EE 383P Fourier Optics (graduate)
EE 396K/CHE 385C Semiconductor Microlithography (graduate)
CHE 395C Chemical Processes for Microelectronics (graduate)
SSC 380D Statistical Methods II (graduate)
Elected Fellow of IEEE, 2010
Frits Zernike Award for Microlithography, 2009
Elected Fellow of SPIE, 2006
SEMI Award for North America, for contributions in lithography modeling and education, 2003
Best Paper Award, 18th Annual BACUS Symposium on Photomask Technology and Management, 1998.
Fellow of SPIE
Fellow of IEEE
Senior member of the Optical Society of America (OSA)
Member of the Board of Trustees, Rose-Hulman Institute of Technology, 2008 – present
Member of the Board of Advisors to the Physics Department, Rose-Hulman Institute of Technology, 2000 – 2008
Member of the Board of Advisors to the Chemistry Department, Rose-Hulman Institute of Technology, 2003 – 2008
Member of the Board of Advisors to the MEMS Laboratory, Rose-Hulman Institute of Technology, 2004 – 2008
Chairman of the Lithography Technical Working Group of the Optical Society of America, 1992 – 1996.
Conference Chair, Microlithographic Techniques in IC Fabrication, SPIE Symposium, 1997 and 2000, Singapore
Conference Chair, Lithography for Semiconductor Manufacturing, SPIE Symposium, 1999 and 2001, Edinburgh, Scotland
Conference Chair, Advanced Microlithography Technology, SPIE Conference, 2007, Beijing, China
Plenary Speaker, SPIE 2003 Symposium on Microlithography.
Member of the Board of Advisors to Semiconductor International magazine, 1993 – 2004
Member of the Board of Advisors to Microlithography World magazine, 2003 – 2008
Contributing Columnist for Microlithography World magazine, 1993 – 2008
Associate Editor, Journal of Micro/Nanolithography, MEMS, and MOEMS (JM3), 2002 – 2011
Editor-in-Chief, Journal of Micro/Nanolithography, MEMS, and MOEMS (JM3), 2012 – present
Expert witness consulting in the field of lithography and semiconductor design and manufacturing.
Click here to see a list of technical publications.