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Köhler Illumination A method of illuminating the mask in a projection imaging system whereby a condenser lens forms an image of the illumination source at the entrance pupil of the objective lens, and the mask is at the exit pupil of the condenser lens.
Example: The use of Köhler illumination has become standard in projection lithography due to its superior uniformity.
KrF Krypton Fluoride, a type of excimer laser used in optical lithography that emits light at about 248 nm.
Example: KrF exposure tools have been the most popular lithographic tools since the 250-nm resolution node.